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EUV Sources for Lithography

Vivek Bakshi author

Format:Paperback

Publisher:SPIE Press

Published:28th Feb '06

Currently unavailable, and unfortunately no date known when it will be back

EUV Sources for Lithography cover

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.

ISBN: 9780819496256

Dimensions: unknown

Weight: unknown

1094 pages