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Chemical Beam Epitaxy and Related Techniques

John S Foord editor G J Davies editor W T Tsang editor

Format:Hardback

Publisher:John Wiley & Sons Inc

Published:6th Jun '97

Currently unavailable, and unfortunately no date known when it will be back

Chemical Beam Epitaxy and Related Techniques cover

Chemical Beam Epitaxy (CBE), is a powerful growth technique which has come to prominence over the last ten years. Together with the longer established molecular beam epitaxy (MBE) and metal organic vapour phase epitaxy (MOVPE), CBE provides a capability for the epitaxial growth of semiconductor and other advanced materials with control at the atomic limit. This, the first book dedicated to CBE, and closely related techniques comprises chapters by leading research workers in the field and provides a detailed overview of the state-of-the-art in this area of semiconductor technology. Topics covered include equipment design and safety considerations, design of chemical precursors, surface chemistry and growth mechanisms, materials and devices from arsenide, phosphide, antimonide, silicon and II-VI compounds, doping, selected area epitaxy and etching. The volume provides an introduction for those new to the field and a detailed summary for experienced researchers.

ISBN: 9780471967484

Dimensions: 240mm x 158mm x 30mm

Weight: 851g

460 pages